D shape Chamber of front open door for easy inside operation
Stand along system frameworks and electric rack
System and e-beam source Water Interlock
Optional Substrate Cooling or heating
The DE400D Electron Beam Evaporator is assembled with one e-beam source, the substrate is mounting on the top
of the chamber and rotary or on the horizontal axial on the side of chamber for the substrate polar to change the
deposition angle.
Configuration
Evaporation Chamber | 304 stainless steel chamber with viewport |
Vacuum Pumping | Cryo-pump or Turbo pump and dry rough pump |
Vacuum Valve | Pneumatic HV gate valves |
Evaporation Source | Multi pocket e-beam source |
Optional Load Lock chamber | 304 stainless steel chamber with viewport |
Sample Stage | Top mount and rotary or Side mount polar Substrate |
Film Control | Crystal Film thickness Monitor and Control |
Vacuum Gauging | Wide range vacuum gauge and rough gauge |
Specification
The Base Vacuum Pressure | better than 3E-8 Torr |
Sample Loading Capacity | One Max. 8 inch flat substrate or multi small substrate |
Rate Resolution | 0.05 Angstroms/sec |
Thickness Resolution = 0.02 Angstroms | 0.02 Angstroms |