DE400BHL E-beam Evaporation System

DE400BHL electron beam evaporation system is assembled with a evaporation sources for deposition metal such as Pd, Ti, Al, Au, Pt, Nb or some oxide materials on the up to 2" substrate, and it's assembled with worldwide well known components, the configuration/specification.

Features
Description

Unique Design of Substrate Chamber and Sources chamber isolated by UHV gate valve

All Metal Seal, True UHV System

Stand along system frameworks and electric rack

E-beam source Water Interlock

Optional Substrate Cooling

Configuration

Evaporation Chamber	304 stainless steel chamber with viewport
Vacuum Pumping	Cryo-pump or Turbo pump and dry rough pump
Vacuum Valve	Pneumatic UHV gate valves
Evaporation Source	Multi pocket e-beam source
Substrate Chamber	304 stainless steel chamber with viewport
Sample Stage	Side mount polar Substrate
Film Control	Crystal Film thickness Monitor and Control
Vacuum Gauging	Wide range vacuum gauge and rough gauge

Specification

The Base Vacuum Pressure	better than 9.5E-9 Torr
Sample Loading Capacity	One Max. 2 inch flat substrate
Rate Resolution	0.05 Angstroms/sec
Thickness Resolution = 0.02 Angstroms	0.02 Angstroms

Applications

DE400BHL E-beam Evaporation System

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