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Magnetron Sputtering System
DE Technology manufactures complete integrated sputtering systems to meet your specific deposition requirements. These systems can be configured with multiple RF and/or DC magnetron sources ranging in size from 1 inch (25 mm) to 8 inches (200 mm) in diameter. We can provide systems to handle wafers up to 300 mm in diameter, heating up to 1000°C and RF bias with additional ports for diagnostics.
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DE300D Magnetron Sputtering System
DE300D magnetron sputtering system is assembled with multi magnetron sputtering sources for deposition metals, semiconductor, insulation materials on the up to 6...
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DE500D Magnetron Sputtering System
DE500D magnetron sputtering system is assembled with multi magnetron sputtering sources for deposition metals, semiconductor, insulation materials on the up to 6...
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DE500DL Magnetron Sputtering System
DE500DL magnetron sputtering system is assembled with multi magnetron sputtering sources for deposition metals, semiconductor, insulation materials on the up to ...
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DE600C Magnetron Sputtering System
DE600C magnetron sputtering system is assembled with multi magnetron sputtering sources for deposition metals, semiconductor, insulation materials on the up to 6...
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DE600DL Magnetron Sputtering System
DE600DL magnetron sputtering system is assembled with multi magnetron sputtering sources for deposition metals, semiconductor, insulation materials on the up to ...
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DE600 Magnetron Sputtering System
LOAD LOCK Chamber (option) Chamber with front open door Cryopump and dry pump Up to six magnetron sputter cathode DC, RF or pulse DC power supply Sputter up or d...
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DE350 SiO2 Magnetron Sputtering System
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DE500 Magnetron Sputtering System
DE500 Magnetron Sputter are assembled with four sputter sources for sputtering metals, semiconductor and insulation materials on the substrate up to 6” diameter,...
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