Evaporation Chamber with front O-ring sealing door
Substrate shutter is Closed Loop controlled to open/close by Thin Film Controller
System safety Interlock
Total Auto Control or manual operation by computer
Optional Glove Box
Configuration
Evaporation Chamber | 304 stainless steel chamber with viewport
|
Vacuum Pumping | Turbo pump or cryopump and dry rough pump
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Vacuum Valve
| Pneumatic valves
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Evaporation Source
| Multiple thermal evaporation source |
Sample Stage
| Top or side mounted rotatable sample stage
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Film Control
| Crystal Film thickness Monitor and Control
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Vacuum Gauging
| Wide range vacuum gauge and rough gauge
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Specification
The Base Vacuum Pressure
| Better than 5E-7Torr
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Sample Loading Capacity
| One Max. 6 inch flat substrate
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Film Uniformity
| +/-5% on 6” substrate |
Rate Resolution
| 0.1 Angstroms/sec |
Thickness Resolution
| 0.1 Angstroms
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Typical Application
For R & D Thin Film Deposition
Ideal tools for LIFT-OFF process
Evaporate metal, Semiconductor, Insulation Materials or OLED